Translator Disclaimer
Paper
25 August 1999 New mask blank handling system for the advanced electron-beam writer EX-11
Author Affiliations +
Proceedings Volume 3748, Photomask and X-Ray Mask Technology VI; (1999) https://doi.org/10.1117/12.360222
Event: Photomask and X-Ray Mask Technology VI, 1999, Yokohama, Japan
Abstract
Meeting the latest requirements of aggressive users for advanced masks for optical lithography will be difficult. In addition, improving the productivity and throughput of advanced masks with high-density pattern data is necessary. To overcome these hurdles, Toshiba and Toshiba Machine have developed a new advanced mask writer, the EX-11, shown in Figure 1. The EX-11 takes measures against airborne contamination before drawing is started. It also employs a standard mechanical interface (SMIF) based on the concept of local cleaning technology. This paper describes the design concept of the new mask blank handling system for the EX-11, and the efficiency of these measures was confirmed by the experimental results.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Shusuke Yoshitake, Kenji Ooki, Yoji Ogawa, Katsuhito Ogura, Teruaki Yamamoto, Ryoichi Hirano, Masaki Toriumi, and Toru Tojo "New mask blank handling system for the advanced electron-beam writer EX-11", Proc. SPIE 3748, Photomask and X-Ray Mask Technology VI, (25 August 1999); https://doi.org/10.1117/12.360222
PROCEEDINGS
10 PAGES


SHARE
Advertisement
Advertisement
Back to Top