25 August 1999 Proposal of new layout data format for LSI patterns
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Proceedings Volume 3748, Photomask and X-Ray Mask Technology VI; (1999); doi: 10.1117/12.360192
Event: Photomask and X-Ray Mask Technology VI, 1999, Yokohama, Japan
Abstract
A new LSI layout format LPX (LSI Layout Pattern data Transfer format) applicable to below 0.18 micrometer device generation is proposed. The format is assigned to omit redundant expressions of the GDS-II Stream format. The expression of LPX format uses features of LSI pattern data, and performance of compaction is higher than that of 'gzip,' the famous byte bases data compression tool, the compaction rate with LPX is 0.15, while that with 'gzip' is 0.19. The processing time of conversion to LPX from GDS-II Stream file running with a PentiumPro 200 MHz is 45% shorter than that with 'gzip,' and output file size is 21% smaller than that as well.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Isao Ashida, Yutaka Sato, Hiroichi Kawahira, "Proposal of new layout data format for LSI patterns", Proc. SPIE 3748, Photomask and X-Ray Mask Technology VI, (25 August 1999); doi: 10.1117/12.360192; https://doi.org/10.1117/12.360192
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KEYWORDS
Photomasks

Data processing

Data conversion

Data compression

Optical calibration

Optical proximity correction

Interfaces

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