Reduction of fogging effect caused by scattered electrons in an electron beam system

Naoharu Shimomura; Munehiro Ogasawara; Jun Takamatsu; Shusuke Yoshitake; Kenji Ooki; Noriaki Nakayamada; Fumiyuki Okabe; Toru Tojo

doi:10.1117/12.360242

25 August 1999 Reduction of fogging effect caused by scattered electrons in an electron beam system

Naoharu Shimomura, Munehiro Ogasawara, Jun Takamatsu, Shusuke Yoshitake, Kenji Ooki, Noriaki Nakayamada, Fumiyuki Okabe, Toru Tojo

Author Affiliations +

Proceedings Volume 3748, Photomask and X-Ray Mask Technology VI; (1999) https://doi.org/10.1117/12.360242
Event: Photomask and X-Ray Mask Technology VI, 1999, Yokohama, Japan

Abstract

Background exposure of a resist caused by scattered electrons (the fogging effect) degrades critical dimension accuracy when the pattern density changes over the specimen. We measured the fogging effect in an electron beam optical column. In order to reduce the fogging effect, a scattered electron absorber plate having a converging holes structure was attached to the lower surface of the objective lens. When the most severe pattern for the fogging effect was applied, we achieved the size variation caused by the fogging effect less than 8 nm. The converging holes effectively trap the scattered electrons and greatly reduce the fogging effect.

Citation Download Citation

Naoharu Shimomura, Munehiro Ogasawara, Jun Takamatsu, Shusuke Yoshitake, Kenji Ooki, Noriaki Nakayamada, Fumiyuki Okabe, and Toru Tojo "Reduction of fogging effect caused by scattered electrons in an electron beam system", Proc. SPIE 3748, Photomask and X-Ray Mask Technology VI, (25 August 1999); https://doi.org/10.1117/12.360242

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