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19 July 1999 Imaging interferometric lithography: extending optics to fundamental limits and beyond
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Proceedings Volume 3749, 18th Congress of the International Commission for Optics; (1999) https://doi.org/10.1117/12.354787
Event: ICO XVIII 18th Congress of the International Commission for Optics, 1999, San Francisco, CA, United States
Abstract
Optical lithography has been the mainstay VLSI/ULSI manufacturing technique throughout the entire history of the integrated circuit. The "end" of optical lithography has been oft predicted, and just as often proven premature. Even today, despite all the recent investigation of next-generation lithographies (NGL), it now appears certain that optics will be used for 100-nm critical dimensions (CD) and likely, that optical tools will extend at least to initial stages of the 70-nm CD roadmap node as well, cxtending optical lithography to deep sub-wavelength CDs.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Steven R. J. Brueck "Imaging interferometric lithography: extending optics to fundamental limits and beyond", Proc. SPIE 3749, 18th Congress of the International Commission for Optics, (19 July 1999); https://doi.org/10.1117/12.354787
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