Industrial applications of a high-sensitivity linear birefringence measurement system

Baoliang Bob Wang; Theodore C. Oakberg; Paul Kadlec

doi:10.1117/12.366330

25 October 1999 Industrial applications of a high-sensitivity linear birefringence measurement system

Baoliang Bob Wang, Theodore C. Oakberg, Paul Kadlec

Proceedings Volume 3754, Polarization: Measurement, Analysis, and Remote Sensing II; (1999) https://doi.org/10.1117/12.366330
Event: SPIE's International Symposium on Optical Science, Engineering, and Instrumentation, 1999, Denver, CO, United States

Abstract

In this paper we introduce an instrument developed recently for measuring low level birefringence. Known as the Exicor system, this instrument has two detecting channels for measuring both the magnitude and orientation of linear birefringence in transparent optical materials. The Exicor system, employing a low birefringent photoelastic modulator (PEM), provides high level sensitivity of approximately 0.005 nm and good time resolution of < 2s per data point. We present applications of the Exicor system to a variety of otpical samples with industrial importance, including PEM optical elements, compact disc blanks, photomask blanks and other optical components.

Citation Download Citation

Baoliang Bob Wang, Theodore C. Oakberg, and Paul Kadlec "Industrial applications of a high-sensitivity linear birefringence measurement system", Proc. SPIE 3754, Polarization: Measurement, Analysis, and Remote Sensing II, (25 October 1999); https://doi.org/10.1117/12.366330

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