PROCEEDINGS VOLUME 3767
SPIE'S INTERNATIONAL SYMPOSIUM ON OPTICAL SCIENCE, ENGINEERING, AND INSTRUMENTATION | 18-23 JULY 1999
EUV, X-Ray, and Neutron Optics and Sources
SPIE'S INTERNATIONAL SYMPOSIUM ON OPTICAL SCIENCE, ENGINEERING, AND INSTRUMENTATION
18-23 July 1999
Denver, CO, United States
Soft X-Ray Sources
Proc. SPIE 3767, Liquid-target laser-plasma sources for EUV and x-ray lithography, 0000 (23 November 1999); doi: 10.1117/12.371104
Proc. SPIE 3767, Characterization and optimization of a laser-produced x-ray source with a gas puff target, 0000 (23 November 1999); doi: 10.1117/12.371110
Proc. SPIE 3767, High-power x-ray point source for next-generation lithography, 0000 (23 November 1999); doi: 10.1117/12.371118
Proc. SPIE 3767, Toward a high-average-power and debris-free soft x-ray source for microlithography pumped by a long-pulse excimer laser, 0000 (23 November 1999); doi: 10.1117/12.371128
Soft X-Ray Optics
Proc. SPIE 3767, Polycapillary collimator for laser-generated plasma source x-ray lithography, 0000 (23 November 1999); doi: 10.1117/12.371136
Proc. SPIE 3767, High-uniformity collimator for x-ray proximity lithography, 0000 (23 November 1999); doi: 10.1117/12.371142
Proc. SPIE 3767, Large-field high-resolution x-ray monochromatic microscope based on spherical crystals and high-repetition-rate laser-produced plasmas, 0000 (23 November 1999); doi: 10.1117/12.371143
Hard X-Ray Optics: Microbeam, Microfocus, and Polycapillary Optics
Proc. SPIE 3767, Refractive x-ray focusing with modified phonograph records, 0000 (23 November 1999); doi: 10.1117/12.371105
Proc. SPIE 3767, Characterization of multifiber polycapillary x-ray collimating optics, 0000 (23 November 1999); doi: 10.1117/12.371106
Proc. SPIE 3767, Potential of polycapillary optics for hard x-ray medical imaging applications, 0000 (23 November 1999); doi: 10.1117/12.371107
Hard X-Ray Optics: Metrology, Crystals, and Mirrors
Proc. SPIE 3767, Testing of glancing incidence mirrors using sampled profile measurements, 0000 (23 November 1999); doi: 10.1117/12.371108
Proc. SPIE 3767, Recent development of doubly curved crystal focusing optics and their applications for micro XRF, 0000 (23 November 1999); doi: 10.1117/12.371109
EUV and X-Ray Optics Keynote Presentations
Proc. SPIE 3767, High-power source and illumination system for extreme ultraviolet lithography, 0000 (23 November 1999); doi: 10.1117/12.371111
Proc. SPIE 3767, Smoothing of mirror substrates by thin-film deposition, 0000 (23 November 1999); doi: 10.1117/12.371112
Proc. SPIE 3767, Recent advances in EUV phase-shifting point diffraction interferometry, 0000 (23 November 1999); doi: 10.1117/12.371113
Proc. SPIE 3767, Progress in the development of three-aspherical mirror optics for EUVL, 0000 (23 November 1999); doi: 10.1117/12.371114
Proc. SPIE 3767, Review of x-ray collimators for x-ray proximity lithography, 0000 (23 November 1999); doi: 10.1117/12.371115
Proc. SPIE 3767, Laterally graded multilayer optics for x-ray analysis, 0000 (23 November 1999); doi: 10.1117/12.371116
Proc. SPIE 3767, Diffraction geometry optimization with polycapillary x-ray optics, 0000 (23 November 1999); doi: 10.1117/12.371117
EUV Lithography
Proc. SPIE 3767, Multilayer coated optics for an alpha-class extreme ultraviolet lithography system, 0000 (23 November 1999); doi: 10.1117/12.371119
Proc. SPIE 3767, Lifetime studies of Mo/Si and Mo/Be multilayer coatings for extreme ultraviolet lithography, 0000 (23 November 1999); doi: 10.1117/12.371120
Proc. SPIE 3767, Novel condenser for EUV lithography ring-field projection optics, 0000 (23 November 1999); doi: 10.1117/12.371121
EUV Multilayers and Gratings
Proc. SPIE 3767, Development of soft x-ray multilayer mirrors for a wavelength of 3 nm, 0000 (23 November 1999); doi: 10.1117/12.371122
Proc. SPIE 3767, Control of Mo/Si multilayers for soft x-ray performance, 0000 (23 November 1999); doi: 10.1117/12.371123
Proc. SPIE 3767, Optical constants of beryllium from photoabsorption measurements for x-ray optics applications, 0000 (23 November 1999); doi: 10.1117/12.371124
Proc. SPIE 3767, Experimental investigation of beryllium-based multilayer coatings for extreme ultraviolet lithography, 0000 (23 November 1999); doi: 10.1117/12.371125
Proc. SPIE 3767, Microfocusing VLS-grating-based beamline for advanced microscopy, 0000 (23 November 1999); doi: 10.1117/12.371126
Neutron Sources and Optics I
Proc. SPIE 3767, Performance comparisons for the ILL neutron spin echo spectrometer IN15 in its standard and focusing mirror configurations, 0000 (23 November 1999); doi: 10.1117/12.371127
Proc. SPIE 3767, Numerical simulation of multiple reflection in the stacked supermirror blades of a Doppler-shifting ultracold neutron generator, 0000 (23 November 1999); doi: 10.1117/12.371129
Proc. SPIE 3767, Curved-crystal three-axis neutron spectrometry with position-sensitive detection, 0000 (23 November 1999); doi: 10.1117/12.371130
Proc. SPIE 3767, Development of the neutron phase contrast imaging technique and its application in material science research, 0000 (23 November 1999); doi: 10.1117/12.371131
Proc. SPIE 3767, Search for effects on neutron transmission due to multiple reflection by glass capillary walls, 0000 (23 November 1999); doi: 10.1117/12.371132
Neutron Sources and Optics II
Proc. SPIE 3767, Development of a supermirror Doppler shifter for quasi-continuous ultracold neutron generation at pulsed neutron sources, 0000 (23 November 1999); doi: 10.1117/12.371133
Proc. SPIE 3767, New measurements with a perfect crystal cavity for neutrons, 0000 (23 November 1999); doi: 10.1117/12.371134
Proc. SPIE 3767, Neutron multilayer structures for fundamental experiments in UCN optics, 0000 (23 November 1999); doi: 10.1117/12.371135
Proc. SPIE 3767, Experimental test of the de Broglie wave packet nature of the neutron, 0000 (23 November 1999); doi: 10.1117/12.371137
Proc. SPIE 3767, Matching bent crystals to high-brilliance sources, 0000 (23 November 1999); doi: 10.1117/12.371138
Soft X-Ray Sources
Proc. SPIE 3767, EUV spectroscopy of ultrafast capillary discharges, 0000 (23 November 1999); doi: 10.1117/12.371139
EUV Multilayers and Gratings
Proc. SPIE 3767, Dual-function EUV multilayer mirrors for the IMAGE mission, 0000 (23 November 1999); doi: 10.1117/12.371140
Proc. SPIE 3767, Optical constants of sputtered U and a-Si at 30.4 and 58.4 nm, 0000 (23 November 1999); doi: 10.1117/12.371141
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