23 November 1999 Development of soft x-ray multilayer mirrors for a wavelength of 3 nm
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Fabrication process of soft X-ray multilayer mirrors composed of Sc/Cr having shown high reflectances above 10% including the highest 14.8% for a wavelength of 3 nm is described. The multilayers were prepared by ion beam sputtering of an electron cyclotron resonance type enabling sputter deposition at the highest vacuum of 0.03m Torr. The multilayers were prepared at a stable deposition rate within 4 hours to suppress period instability and also at various substrate temperatures to find the best condition to suppress the interface roughness.
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Kiwamu Sakano, Kiwamu Sakano, Masaki Yamamoto, Masaki Yamamoto, } "Development of soft x-ray multilayer mirrors for a wavelength of 3 nm", Proc. SPIE 3767, EUV, X-Ray, and Neutron Optics and Sources, (23 November 1999); doi: 10.1117/12.371122; https://doi.org/10.1117/12.371122


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