23 November 1999 High-uniformity collimator for x-ray proximity lithography
Author Affiliations +
Abstract
An x-ray optic suitable for use in x-ray proximity lithography is described. It employs multiple flat mirror facets arranged at grazing incidence, each of which creates an optically independent channel that covers the entire target. The facets are arranged so that many channels can simultaneously illuminate the target, thereby achieving high flux at the target with high uniformity. Lithographic constraints on local and global divergence at the mask are met by making the optic small and placing it sufficiently distant from the target.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Webster C. Cash, "High-uniformity collimator for x-ray proximity lithography", Proc. SPIE 3767, EUV, X-Ray, and Neutron Optics and Sources, (23 November 1999); doi: 10.1117/12.371142; https://doi.org/10.1117/12.371142
PROCEEDINGS
8 PAGES


SHARE
RELATED CONTENT

Single stepper soft x ray source for step and scan...
Proceedings of SPIE (July 07 1997)
High-uniformity collimator for x-ray proximity lithography
Proceedings of SPIE (November 02 2000)
Collimators for laser plasma x-ray sources
Proceedings of SPIE (October 14 1997)
High-power laser-plasma x-ray source for lithography
Proceedings of SPIE (July 01 2002)
Review of x-ray collimators for x-ray proximity lithography
Proceedings of SPIE (November 23 1999)
Reflection masks for soft x-ray projection lithography
Proceedings of SPIE (January 01 1992)

Back to Top