23 November 1999 Polycapillary collimator for laser-generated plasma source x-ray lithography
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Abstract
Collimating of the x-ray beam is essential to point source proximity x-ray lithography for controlling radial magnification and increasing the beam intensity. Polycapillary optic collimators were developed to meet the challenges of point source proximity x-ray lithography. Sophisticated modeling software was developed for design and optimization of polycapillary collimators to meet specific requirements. Using this software, a highly efficient collimator was designed to deliver a well-collimated beam centered at 1.1 keV for a 20 mm X 20 mm field. The collimator was constructed and was tested with both an electron bombardment source and a laser generated plasma source. The design goals of intensity gain and divergence controls have been achieved. The intensity variation within the printing field can be less than 2%.
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Zewu Chen, Russell Youngman, Tom Bievenue, Qi-Fan Xiao, I. C. Edmond Turcu, Robert K. Grygier, Stanley Mrowka, "Polycapillary collimator for laser-generated plasma source x-ray lithography", Proc. SPIE 3767, EUV, X-Ray, and Neutron Optics and Sources, (23 November 1999); doi: 10.1117/12.371136; https://doi.org/10.1117/12.371136
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