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23 November 1999 Recent advances in EUV phase-shifting point diffraction interferometry
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Abstract
The extreme ultraviolet (EUV) phase-shifting point diffraction interferometer (PS/PDI) was developed and implemented at Lawrence Berkeley National Laboratory to meet the significant measurement challenge of characterizing EUV projection lithography optics. The PS/PDI has been in continuous use and under ongoing development since 1996. Here we describe recent improvements made to the interferometer, and we summarize metrology results from state-of-the-art 10x-reduction EUV projection optics.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Patrick P. Naulleau, Kenneth A. Goldberg, Sang Hun Lee, Chang-Hasnain C. Chang, Phillip J. Batson, David T. Attwood Jr., and Jeffrey Bokor "Recent advances in EUV phase-shifting point diffraction interferometry", Proc. SPIE 3767, EUV, X-Ray, and Neutron Optics and Sources, (23 November 1999); https://doi.org/10.1117/12.371113
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