23 November 1999 Review of x-ray collimators for x-ray proximity lithography
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Abstract
Simple arguments are given that elucidate the need for x-ray collimator optics in point source proximity lithography. Seven recent collimator optics deigns are briefly described. Three of these designs are described in greater detail: a flat mirror array developed by Xmetrics, Inc.; a polycapillary array developed by X-Ray Optical Systems, Inc.; and a scanning paraboloidal collimator developed by Lawrence Livermore National Laboratory. For the latter two collimators test results using the JMAR Technologies, Inc. laser plasma x-ray point source are given.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Stephen M. Lane, Troy W. Barbee, Stanley Mrowka, Juan R. Maldonado, "Review of x-ray collimators for x-ray proximity lithography", Proc. SPIE 3767, EUV, X-Ray, and Neutron Optics and Sources, (23 November 1999); doi: 10.1117/12.371115; https://doi.org/10.1117/12.371115
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