23 November 1999 Review of x-ray collimators for x-ray proximity lithography
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Simple arguments are given that elucidate the need for x-ray collimator optics in point source proximity lithography. Seven recent collimator optics deigns are briefly described. Three of these designs are described in greater detail: a flat mirror array developed by Xmetrics, Inc.; a polycapillary array developed by X-Ray Optical Systems, Inc.; and a scanning paraboloidal collimator developed by Lawrence Livermore National Laboratory. For the latter two collimators test results using the JMAR Technologies, Inc. laser plasma x-ray point source are given.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Stephen M. Lane, Stephen M. Lane, Troy W. Barbee, Troy W. Barbee, Stanley Mrowka, Stanley Mrowka, Juan R. Maldonado, Juan R. Maldonado, "Review of x-ray collimators for x-ray proximity lithography", Proc. SPIE 3767, EUV, X-Ray, and Neutron Optics and Sources, (23 November 1999); doi: 10.1117/12.371115; https://doi.org/10.1117/12.371115


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