23 November 1999 Toward a high-average-power and debris-free soft x-ray source for microlithography pumped by a long-pulse excimer laser
Author Affiliations +
Abstract
We present the exciting results obtained by using a natural (i.e. as long as the active medium gain) 120 ns-duration excimer laser pulse focused on relatively thick targets (100 micrometer): a conversion efficiency exceeding 20% has been obtained in the 40 - 70 eV (170 - 300 Angstrom) spectral interval from Cu and Ta targets, with more than 100-ns-FWHM X- ray pulses and low speed (less than 100 m/s) emitted debris. A fast CCD camera is used to reveal the debris and to measure their speed for different laser parameters. These values of debris speed are compatible with the use of a mechanical device to separate them from the X-ray beam and hence to protect the optics of a projection-microlithography system.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Sarah Bollanti, Paolo Di Lazzaro, Francesco Flora, Tommaso Letardi, Alessandro Marinai, Alessandro Nottola, Kostandia Vigli-Papadaki, A. Vitali, Francesca Bonfigli, Nicola Lisi, Libero Palladino, Armando Reale, Cheng En Zheng, "Toward a high-average-power and debris-free soft x-ray source for microlithography pumped by a long-pulse excimer laser", Proc. SPIE 3767, EUV, X-Ray, and Neutron Optics and Sources, (23 November 1999); doi: 10.1117/12.371128; https://doi.org/10.1117/12.371128
PROCEEDINGS
12 PAGES


SHARE
Back to Top