23 November 1999 Toward a high-average-power and debris-free soft x-ray source for microlithography pumped by a long-pulse excimer laser
Author Affiliations +
Abstract
We present the exciting results obtained by using a natural (i.e. as long as the active medium gain) 120 ns-duration excimer laser pulse focused on relatively thick targets (100 micrometer): a conversion efficiency exceeding 20% has been obtained in the 40 - 70 eV (170 - 300 Angstrom) spectral interval from Cu and Ta targets, with more than 100-ns-FWHM X- ray pulses and low speed (less than 100 m/s) emitted debris. A fast CCD camera is used to reveal the debris and to measure their speed for different laser parameters. These values of debris speed are compatible with the use of a mechanical device to separate them from the X-ray beam and hence to protect the optics of a projection-microlithography system.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Sarah Bollanti, Sarah Bollanti, Paolo Di Lazzaro, Paolo Di Lazzaro, Francesco Flora, Francesco Flora, Tommaso Letardi, Tommaso Letardi, Alessandro Marinai, Alessandro Marinai, Alessandro Nottola, Alessandro Nottola, Kostandia Vigli-Papadaki, Kostandia Vigli-Papadaki, A. Vitali, A. Vitali, Francesca Bonfigli, Francesca Bonfigli, Nicola Lisi, Nicola Lisi, Libero Palladino, Libero Palladino, Armando Reale, Armando Reale, Cheng En Zheng, Cheng En Zheng, } "Toward a high-average-power and debris-free soft x-ray source for microlithography pumped by a long-pulse excimer laser", Proc. SPIE 3767, EUV, X-Ray, and Neutron Optics and Sources, (23 November 1999); doi: 10.1117/12.371128; https://doi.org/10.1117/12.371128
PROCEEDINGS
12 PAGES


SHARE
Back to Top