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16 November 1999 Two-wave x-ray methods for characterization of supersmooth substrates and thin films
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Abstract
X-ray reflectometry is usually applied for determination of optical constant of materials on the basis of measurements of angular dependent reflectivity. New reflectometry methods based on measurements of either the derivatives with respect to the grazing angle or the ratios of reflection coefficients for two characteristic wavelengths are suggested in present paper. Calculations and measurements indicate that the method suggested makes it possible to enhance the sensitivity of reflectometry and the accuracy of measuring optical constants. Practical implementation of the method is based on the original system of selecting the monochromatic beams with the use of semitransparent crystals. The results of reflectometry studies of GaAs monocrystals and a Ga0.25Si0.75-Si multilayer structure on a Si substrate are reported.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Alexander V. Vinogradov, Igor V. Pirshin, Alexander G. Touryanski, and Rouslan M. Fechtchenko "Two-wave x-ray methods for characterization of supersmooth substrates and thin films", Proc. SPIE 3773, X-Ray Optics Design, Performance, and Applications, (16 November 1999); https://doi.org/10.1117/12.370090
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