15 November 1999 Modeling of laminar e-beam source for SCALPEL
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Abstract
The SCALPEL e-beam lithography tool requires an extremely uniform e-beam to illuminate the Mask. To meet this requirement, the SCALPEL POL tool source cathode operates in the temperature limited mode. In this mode, all cathode irregularities are imaged at the Mask plane due to the high DOF of the gun immersion objective. We have studied the possibility of Mask illumination with a laminar e-beam having its virtual source located beyond the immersion objective DOF. In this case, using a positively biased Wehnelt, one can obtain a laminar e-beam that provides high emittance and low brightness illumination, while also yielding an efficient in- gun correction of beam properties.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Warren K. Waskiewicz, Warren K. Waskiewicz, James Alexander Liddle, James Alexander Liddle, Victor Katsap, Victor Katsap, } "Modeling of laminar e-beam source for SCALPEL", Proc. SPIE 3777, Charged Particle Optics IV, (15 November 1999); doi: 10.1117/12.370140; https://doi.org/10.1117/12.370140
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