28 September 1999 Carbon fiber composite photomask stage component
Author Affiliations +
Abstract
The semiconductor industry utilizes complex patterning tools to achieve the patterning of fine features. These tools require stiff, lightweight, dimensionally stable components in order to reliably pattern photomasks and wafers. Traditionally, these tools have used metals, ceramics, and low expansion glasses. However, a new class of materials, high performance composites, have demonstrated promise for replacing these materials. This paper discusses the design, manufacturing, and test of a carbon fiber composite stage component of an electron beam lithography tool.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Brian E. Catanzaro, Jack E. Dyer, David Trost, "Carbon fiber composite photomask stage component", Proc. SPIE 3786, Optomechanical Engineering and Vibration Control, (28 September 1999); doi: 10.1117/12.363797; https://doi.org/10.1117/12.363797
PROCEEDINGS
9 PAGES


SHARE
KEYWORDS
Composites

Electron beam lithography

Photomasks

Semiconducting wafers

Carbon

Interfaces

Manufacturing

RELATED CONTENT


Back to Top