28 September 1999 New metrology stage for ion projection lithography made of glass ceramics
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In the next few years a new chip-generation with structure sizes well below 100 nm and high complexity will require novel, so-called 'future lithography' processes. One of these new technologies is the Ion Projection Lithography. Within the framework of a large European project lead by SIEMENS, the necessary technologies are developed and the first pilot system will be built. In this system, one of the most important units is a high precision wafer stage. The heart of the stage system is the so-called metrology - plate with integrated electrostatic wafer chuck and handling unit. The design of this novel stage system is described in this contribution. Extensive FEM-simulations from the basis of the present design. All major components are made from glass-ceramics to guarantee the highest possible thermal and mechanical stability. Not only in the field of lithography many modern precision mechanical systems require position tolerances in the sub-micrometer and seconds of arc range. Strong systems solutions can be developed by the effort of glass-ceramics and new and traditional manufacturing processes.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Stefan Risse, Stefan Risse, Thomas Peschel, Thomas Peschel, Christoph Damm, Christoph Damm, Ulf Carsten Kirschstein, Ulf Carsten Kirschstein, "New metrology stage for ion projection lithography made of glass ceramics", Proc. SPIE 3786, Optomechanical Engineering and Vibration Control, (28 September 1999); doi: 10.1117/12.363812; https://doi.org/10.1117/12.363812


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