11 October 1999 New ion-assisted filtered cathodic arc deposition (IFCAD) technology for producing advanced thin films on temperature-sensitive substrates
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Abstract
An innovative Ion-Assisted Filtered Cathodic Arc Deposition (IFCAD) system has been developed for low temperature production of thin-film coatings. The IFCAD system employs electro-magnetic and mechanical filtering techniques to remove unwanted macroparticles and neutral atoms from the plasma stream. Therefore, only ions within a defined energy range arrive at the substrate surface, depositing thin-films with excellent mechanical and optical properties. Ion- Assisted-Deposition is coupled with Filtered Cathodic Arc technology to enhance and modify the arc deposited thin- films. Using an advanced computer controlled plasma beam scanning system, high quality, large area, uniform IFCAD multi-layer film structures are attained. Amorphous Diamond- Like-Carbon films (up to 85% sp3 bonded carbon; and micro- hardness greater than 50 GPa) have been deposited in multi- layer thin-film combinations with other IFCAD source materials (such as: Al2O3) for optical and tribological applications. Rutile TiO2 (refractive index of 2.8 at 500 nm) has been deposited with this technology for advanced optical filter applications. The new IFCAD technology has been included in development programs, such as: plastic and glass lens coatings for optical systems; wear resistant coatings on various metal substrates, ultra smooth, durable, surface hydrophobic coatings for aircraft windows; EUV coatings for space instrumentation; transparent conductive coatings; and UV protective coatings for solar cell concentrator plastic Fresnel lens elements for space power.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Michael L. Fulton, "New ion-assisted filtered cathodic arc deposition (IFCAD) technology for producing advanced thin films on temperature-sensitive substrates", Proc. SPIE 3789, Solar Optical Materials XVI, (11 October 1999); doi: 10.1117/12.367562; https://doi.org/10.1117/12.367562
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