22 September 1999 Deposition of chromium atoms by using the radiation force of a frequency-doubled laser diode for direct atomic lithography
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Abstract
We have developed a nanometric fabrication system by manipulating chromium (Cr) atoms with laser beams. We utilized a laser diode with very narrow linewidth (approximately 5 MHz) to generate the photon force on the Cr atoms. The gradient force is exerted on the atoms in a standing wave, and the atoms are deposited in the periodical low potential regions of the standing wave, and a series of Cr lines are formed on the substrate with the periodicity of the standing wave. In order to optimize conditions for this deposition technique, we have performed a numerical analysis of the property of fabrication by tracing the trajectories of the atoms in the potential of light field. We found that the laser power and the degree of the collimation of the atom beam are important to obtain sharp structures. In addition, the longitudinal deceleration of the atom beam reduces strongly the structure size and increases the depth of the focus of the atom beam.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kenji Okamoto, Hironobu Inouye, Yasushi Inouye, Satoshi Kawata, "Deposition of chromium atoms by using the radiation force of a frequency-doubled laser diode for direct atomic lithography", Proc. SPIE 3791, Near-Field Optics: Physics, Devices, and Information Processing, (22 September 1999); doi: 10.1117/12.363852; https://doi.org/10.1117/12.363852
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