Photochemical vapor deposition by optical near field

Yoh Yamamoto; Vitali V. Polonski; Geun Hyoung Lee; Motonobu Kourogi; Motoichi Ohtsu

doi:10.1117/12.363849

22 September 1999 Photochemical vapor deposition by optical near field

Yoh Yamamoto, Vitali V. Polonski, Geun Hyoung Lee, Motonobu Kourogi, Motoichi Ohtsu

Proceedings Volume 3791, Near-Field Optics: Physics, Devices, and Information Processing; (1999) https://doi.org/10.1117/12.363849
Event: SPIE's International Symposium on Optical Science, Engineering, and Instrumentation, 1999, Denver, CO, United States

Abstract

In-situ patterning of nano-scale Zn dots and lines has been succeeded by photodissociation of a gas-phase diethylzinc in optical near-field. By using an optical fiber probe with the aperture diameter of 60 nm, dots with full width at half maximum of approximately 60 nm and approximately 70 nm, closely separated by 100 nm were fabricated. It implies that finer patterns of a metal can be fabricated by using optical fiber probe with smaller aperture, allowing control of the size and position of nano-scale structures. Consequently, the technique is the one of most suitable for nano-photonic device fabrication.

Citation Download Citation

Yoh Yamamoto, Vitali V. Polonski, Geun Hyoung Lee, Motonobu Kourogi, and Motoichi Ohtsu "Photochemical vapor deposition by optical near field", Proc. SPIE 3791, Near-Field Optics: Physics, Devices, and Information Processing, (22 September 1999); https://doi.org/10.1117/12.363849

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