22 September 1999 Photochemical vapor deposition by optical near field
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In-situ patterning of nano-scale Zn dots and lines has been succeeded by photodissociation of a gas-phase diethylzinc in optical near-field. By using an optical fiber probe with the aperture diameter of 60 nm, dots with full width at half maximum of approximately 60 nm and approximately 70 nm, closely separated by 100 nm were fabricated. It implies that finer patterns of a metal can be fabricated by using optical fiber probe with smaller aperture, allowing control of the size and position of nano-scale structures. Consequently, the technique is the one of most suitable for nano-photonic device fabrication.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yoh Yamamoto, Yoh Yamamoto, Vitali V. Polonski, Vitali V. Polonski, Geun Hyoung Lee, Geun Hyoung Lee, Motonobu Kourogi, Motonobu Kourogi, Motoichi Ohtsu, Motoichi Ohtsu, } "Photochemical vapor deposition by optical near field", Proc. SPIE 3791, Near-Field Optics: Physics, Devices, and Information Processing, (22 September 1999); doi: 10.1117/12.363849; https://doi.org/10.1117/12.363849

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