Binary deposition method using standard CMOS structural layers to fabricate optical gratings and microlenses

Lung Jieh Yang; P. C. Liu; Shung-Wen Kang; W. C. Duh; Peizen Chang; Chih-Kung Lee

doi:10.1117/12.370212

12 November 1999 Binary deposition method using standard CMOS structural layers to fabricate optical gratings and microlenses

Lung Jieh Yang, P. C. Liu, Shung-Wen Kang, W. C. Duh, Peizen Chang, Chih-Kung Lee

Author Affiliations +

Proceedings Volume 3795, Terahertz and Gigahertz Photonics; (1999) https://doi.org/10.1117/12.370212
Event: SPIE's International Symposium on Optical Science, Engineering, and Instrumentation, 1999, Denver, CO, United States

Abstract

The binary lithography combined with precise control of RIE (Reactive Ion Etch) could fabricate an 8-level blazed grating with the reflective efficiency above 80% in recent years. The pixel size of the 8-level grating is often designed to be 32 microns or even larger due to the manipulation error of the mask-aligner. By the excellent augmentation of the mask-stepper, which is popular in IC industry, the smaller pixel size or the higher-order levels of the gratings could be achieved ideally.

Citation Download Citation

Lung Jieh Yang, P. C. Liu, Shung-Wen Kang, W. C. Duh, Peizen Chang, and Chih-Kung Lee "Binary deposition method using standard CMOS structural layers to fabricate optical gratings and microlenses", Proc. SPIE 3795, Terahertz and Gigahertz Photonics, (12 November 1999); https://doi.org/10.1117/12.370212

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