12 November 1999 Binary deposition method using standard CMOS structural layers to fabricate optical gratings and microlenses
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Abstract
The binary lithography combined with precise control of RIE (Reactive Ion Etch) could fabricate an 8-level blazed grating with the reflective efficiency above 80% in recent years. The pixel size of the 8-level grating is often designed to be 32 microns or even larger due to the manipulation error of the mask-aligner. By the excellent augmentation of the mask-stepper, which is popular in IC industry, the smaller pixel size or the higher-order levels of the gratings could be achieved ideally.
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Lung Jieh Yang, Lung Jieh Yang, P. C. Liu, P. C. Liu, Shung-Wen Kang, Shung-Wen Kang, W. C. Duh, W. C. Duh, Peizen Chang, Peizen Chang, Chih-Kung Lee, Chih-Kung Lee, } "Binary deposition method using standard CMOS structural layers to fabricate optical gratings and microlenses", Proc. SPIE 3795, Terahertz and Gigahertz Photonics, (12 November 1999); doi: 10.1117/12.370212; https://doi.org/10.1117/12.370212
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