Array illumination is always required for a large-size optical parallel processing system. Talbot array illuminator is highly interesting for a large-size array illumination with high efficiency, excellent uniformity, error-tolerance, and cheap massive fabrication. Theoretically, we derived a new method that can be used to reveal the simple relations between the phase levels of Talbot illuminator and the opening ratio (1/M) of the generated array. Experimentally, we demonstrated an integrated edge-improved Talbot array illuminator. We fabricated one piece of Talbot illuminator with the period of d equals 200 micrometers , opening ratio of 1/2, and binary-phase (0,(pi) ) modulation. One cuboid piece of K9 glass with two-side surfaces coated for high reflection is glued with the Talbot illuminator. The integrated piece is shown to improve the edge uniformity of array illumination at the output plane. Due to wide applications of array illumination, our proposed methods are interesting for miniature of integrated microoptical processing system.