Translator Disclaimer
14 July 1999 Optical investigations of Cr and CrN layers obtained by magnetron sputtering in ion-beam-assisted deposition process (IBAD)
Author Affiliations +
Proceedings Volume 3820, 11th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics; (1999) https://doi.org/10.1117/12.353095
Event: Eleventh Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics, 1998, Stara Lesna, Slovakia
Abstract
In the ion beam deposition process the source of material was Cr target subjected to magnetron sputtering. Cr and CrN layers deposition processes were carried out in the presence of Ar and Ar + N2 ions atmosphere. The optical investigations of Cr and CrN layers obtained by IBAD processes were made to estimate the efficiency of such modifying factor as ion beam bombardment. The optical constants n and k were determined by ellipsometry for Cr and CrN layers deposited onto grounded or negatively biased (bias voltages from 0 to 500 V) BK7 glass substrates.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Waldemar Oleszkiewicz, Ewa Oleszkiewicz, and Krystyna Zukowska "Optical investigations of Cr and CrN layers obtained by magnetron sputtering in ion-beam-assisted deposition process (IBAD)", Proc. SPIE 3820, 11th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics, (14 July 1999); https://doi.org/10.1117/12.353095
PROCEEDINGS
6 PAGES


SHARE
Advertisement
Advertisement
RELATED CONTENT

Contamination control in ion beam sputter-deposited films
Proceedings of SPIE (September 26 2013)
Fluorescence studies on optical coatings
Proceedings of SPIE (June 05 2018)
Ion beam and dual ion beam sputter deposition of tantalum...
Proceedings of SPIE (November 04 1994)

Back to Top