21 September 1999 Active vision approach for optimizing illumination in critical surface inspection by machine vision
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Proceedings Volume 3824, Optical Measurement Systems for Industrial Inspection; (1999) https://doi.org/10.1117/12.364248
Event: Industrial Lasers and Inspection (EUROPTO Series), 1999, Munich, Germany
Abstract
This paper describes a new method for the adaptive control of imaging parameters in automized machine vision systems. By these new methods even in case of critical objects, which show metal and specular reflections or having polished surfaces, the imaging parameters like illumination can be adjusted optimally without any prior knowledge about the surface characteristics. As a result, an image is generated, which is almost free of irrelevant information in the image. This optimized image only contains the 'real' edges actually found on the object's surface and is free of effects resulting from specular reflections or shadows. Surface inspection for scratches, texture analysis or for dimensional measurements becomes much more reliable now.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tilo Pfeifer, Lorenz Wiegers, "Active vision approach for optimizing illumination in critical surface inspection by machine vision", Proc. SPIE 3824, Optical Measurement Systems for Industrial Inspection, (21 September 1999); doi: 10.1117/12.364248; https://doi.org/10.1117/12.364248
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