Paper
9 September 1999 Micromachined e-plane filter for w-band operation
A. Champion, Fatima Masot, David Paul Steenson, Robert E. Miles
Author Affiliations +
Proceedings Volume 3828, Terahertz Spectroscopy and Applications II; (1999) https://doi.org/10.1117/12.361068
Event: Industrial Lasers and Inspection (EUROPTO Series), 1999, Munich, Germany
Abstract
In this paper we describe the realization and electrical performance of a micromachined E-plane filter for operation at a central frequency of 90 GHz. The micro-machining technique employed here for the filter fabrication is based on the use of an ultra-thick photoresist, the EPON SU-8, which gives precise control of 2D and 3D structures at the 1-100 micrometers level. In the work described her, the E-plane ladder was micromachined and mounted in a conventional metal waveguide for electrical characterization purposes. The results show that the performance of the micromachined filter is comparable to its metal counterpart, with the additional advantages of a much lighter structure, greater ease of fabrication and at lower cost.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
A. Champion, Fatima Masot, David Paul Steenson, and Robert E. Miles "Micromachined e-plane filter for w-band operation", Proc. SPIE 3828, Terahertz Spectroscopy and Applications II, (9 September 1999); https://doi.org/10.1117/12.361068
Lens.org Logo
CITATIONS
Cited by 2 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Waveguides

Metals

Micromachining

Photoresist materials

Planar waveguides

Sputter deposition

Fabrication

Back to Top