Laser Plasma X-Ray Source Optimization For Lithography

Harold M. Epstein; Philip J. Mallozzi; Bernerd E. Campbell

doi:10.1117/12.934968

9 August 1983 Laser Plasma X-Ray Source Optimization For Lithography

Harold M. Epstein, Philip J. Mallozzi, Bernerd E. Campbell

Proceedings Volume 0385, Laser Processing of Semiconductor Devices; (1983) https://doi.org/10.1117/12.934968
Event: 1983 Los Angeles Technical Symposium, 1983, Los Angeles, United States

Abstract

The laser-plasma X-ray source has been evaluated for submicrometer X-ray lithography exposure machines. X-ray lithography systems based on commercially available lasers of reasonable cost appear to be feasible. Such machines would make full wafer exposures of silicon slices with a throughput consistent with current manufacturing requirements.

Citation Download Citation

Harold M. Epstein, Philip J. Mallozzi, and Bernerd E. Campbell "Laser Plasma X-Ray Source Optimization For Lithography", Proc. SPIE 0385, Laser Processing of Semiconductor Devices, (9 August 1983); https://doi.org/10.1117/12.934968

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