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18 November 1999 Pulsed-laser deposition as a novel preparation technique for chemical microsensors
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Proceedings Volume 3857, Chemical Microsensors and Applications II; (1999) https://doi.org/10.1117/12.370281
Event: Photonics East '99, 1999, Boston, MA, United States
Abstract
The application of sensitive layers for chemical microsensors consisting of multicomponent compositions and dielectric materials requires specific deposition techniques, since the different chemical and physical properties of the respective components can be significantly disturbed during the deposition process. To avoid this drawback, the pulsed laser deposition technique is suggested as a novel thin film preparation method for such sensor devices.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Michael J. Schoening, Juergen Schubert, Willi Zander, Mattea Mueller-Veggian, Andrey V. Legin, Yuri G. Vlasov, Peter Kordos, and Hans Lueth "Pulsed-laser deposition as a novel preparation technique for chemical microsensors", Proc. SPIE 3857, Chemical Microsensors and Applications II, (18 November 1999); https://doi.org/10.1117/12.370281
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