8 September 1999 Numerical study of pulsed-laser scanning deposition in a diluted ambient gas
Author Affiliations +
Proceedings Volume 3862, 1999 International Conference on Industrial Lasers; (1999) https://doi.org/10.1117/12.361122
Event: International Symposium on Industrial Lasers, 1999, Wuhan, China
Abstract
Laser scanning deposition process is numerically investigated by the means of a Monte-Carlo method. The transport of the atoms ablated from the target through a diluted ambient gas is simulated. Specifically, the influences of the ambient gas (0.0133 - 13.3 Pa), the laser scanning radius, and the substrate-target distance on the spatial distribution and mean energy of the ablated atoms deposited on the substrate are studied. Knowledge useful to understanding the laser scanning deposition process is obtained.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jun Li, Jun Li, Runzhang Yuan, Runzhang Yuan, } "Numerical study of pulsed-laser scanning deposition in a diluted ambient gas", Proc. SPIE 3862, 1999 International Conference on Industrial Lasers, (8 September 1999); doi: 10.1117/12.361122; https://doi.org/10.1117/12.361122
PROCEEDINGS
4 PAGES


SHARE
Back to Top