8 September 1999 Silicon surface grating formation with a high-power UV laser
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Proceedings Volume 3862, 1999 International Conference on Industrial Lasers; (1999) https://doi.org/10.1117/12.361156
Event: International Symposium on Industrial Lasers, 1999, Wuhan, China
Abstract
Semiconductor surface gratings can find applications in various areas, including optical communications, display, storage, and sensing. The diffraction effects of a surface grating can be used for the operations of various devices. Although semiconductor surface gratings can be fabricated with etching techniques, such a process requires the preparation of a mask and is usually quite complicated. Recently, because of the development of high-power laser, direct writing of surface grating with laser has become an important alternative [1 ,2]. Basically, writing grating with laser is a process of exposing the sample to laser interference fringes. The photons at the bright lines of the fringes interact with the sample material to form periodical corrugations. Because we can control the period of the interference fringe through the interferometer setup and the depth of corrugation through the laser power level, fabrication of surface grating with laser is more flexible than other techniques. In this paper, we investigate the interaction mechanisms between laser photons and semiconductor in fabricating silicon surface gratings with 266 nm laser.
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Chengyen Chen, Chengyen Chen, Chung-yen Chao, Chung-yen Chao, Steffen Gurtler, Steffen Gurtler, Cheewee Liu, Cheewee Liu, Chih Chung Yang, Chih Chung Yang, Kung-Jeng Ma, Kung-Jeng Ma, Yih Chang, Yih Chang, } "Silicon surface grating formation with a high-power UV laser", Proc. SPIE 3862, 1999 International Conference on Industrial Lasers, (8 September 1999); doi: 10.1117/12.361156; https://doi.org/10.1117/12.361156
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