30 December 1999 Advanced e-beam lithography system JBX-9000MV for 180-nm masks
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JEOL has developed an E-Beam lithography system JBX-9000MV with a vector scan and variable shaped beam (VSB) electron optics for the manufacture of 180nm - 150nm devices masks. This system employs 50kV accelerating voltage, low space charge effect column and in-lens deflector system. Beam current density is 10A/cm2, maximum mask size is 230 mm (9'), beam address size is 2 nm. Extended evaluation of the system shows pattern placement accuracy of 30 nm or better, field stitching accuracy of 20 nm or better, critical dimension (CD) accuracy of 20 nm or better.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hitoshi Takemura, Hitoshi Takemura, Tadashi Komagata, Tadashi Komagata, Yasutoshi Nakagawa, Yasutoshi Nakagawa, Kazumitsu Tanaka, Kazumitsu Tanaka, "Advanced e-beam lithography system JBX-9000MV for 180-nm masks", Proc. SPIE 3873, 19th Annual Symposium on Photomask Technology, (30 December 1999); doi: 10.1117/12.373325; https://doi.org/10.1117/12.373325

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