Cross-correlation between actinic and visible defect inspection tool for extreme ultraviolet lithography

Seongtae Jeong; Chih-wei Lai; Senajith Rekawa; Christopher C. Walton; Shon T. Prisbrey; Jeffrey Bokor

doi:10.1117/12.373375

30 December 1999 Cross-correlation between actinic and visible defect inspection tool for extreme ultraviolet lithography

Seongtae Jeong, Chih-wei Lai, Senajith Rekawa, Christopher C. Walton, Shon T. Prisbrey, Jeffrey Bokor

Author Affiliations +

Proceedings Volume 3873, 19th Annual Symposium on Photomask Technology; (1999) https://doi.org/10.1117/12.373375
Event: Photomask Technology and Management, 1999, Monterey, CA, United States

Abstract

We present recent experimental results from an actinic (operates at the EUV wavelength) defect inspection system for extreme ultraviolet lithography mask blanks. A method to cross-register and cross-correlate between the actinic inspection system and a commercial visible-light scattering defect inspection system is demonstrated. Thus, random, real defects detected using the visible-light scattering inspection tool can be found and studied by our actinic inspection tool. Several defects with sub-100 nm size (as classified by the visible scattering tool) are found with the actinic inspection tool with a good signal to noise ratio. This result demonstrates the capability of the actinic inspection tool for independent defect counting experiments at a sub-100 nm defect sensitivity level.

Citation Download Citation

Seongtae Jeong, Chih-wei Lai, Senajith Rekawa, Christopher C. Walton, Shon T. Prisbrey, and Jeffrey Bokor "Cross-correlation between actinic and visible defect inspection tool for extreme ultraviolet lithography", Proc. SPIE 3873, 19th Annual Symposium on Photomask Technology, (30 December 1999); https://doi.org/10.1117/12.373375

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