30 December 1999 Cross-correlation between actinic and visible defect inspection tool for extreme ultraviolet lithography
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Abstract
We present recent experimental results from an actinic (operates at the EUV wavelength) defect inspection system for extreme ultraviolet lithography mask blanks. A method to cross-register and cross-correlate between the actinic inspection system and a commercial visible-light scattering defect inspection system is demonstrated. Thus, random, real defects detected using the visible-light scattering inspection tool can be found and studied by our actinic inspection tool. Several defects with sub-100 nm size (as classified by the visible scattering tool) are found with the actinic inspection tool with a good signal to noise ratio. This result demonstrates the capability of the actinic inspection tool for independent defect counting experiments at a sub-100 nm defect sensitivity level.
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Seongtae Jeong, Chih-wei Lai, Senajith Rekawa, Christopher C. Walton, Shon T. Prisbrey, Jeffrey Bokor, "Cross-correlation between actinic and visible defect inspection tool for extreme ultraviolet lithography", Proc. SPIE 3873, 19th Annual Symposium on Photomask Technology, (30 December 1999); doi: 10.1117/12.373375; https://doi.org/10.1117/12.373375
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