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30 December 1999 Defect printability measurement on the KLA-351: correlation to defect sizing using the AVI metrology system
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Abstract
The search for the 'holy grail' of a fast, reliable, inexpensive predictor of defect printability has reached a new level. Taking images from several inspection tools (KLA-351, KLA-353, and KLA Starlight) during defect review, the AVI Photomask Metrology System provides measurement repeatability better than 5 nm, and significantly better correlation to printability than Scanning Electron Microscope (SEM) measurements. SEM measurements of printed defects are compared to various measurements of the defects on the mask. Analysis shows, as expected, that optical area measurements provide the best correlation to printability. Further, images from existing inspection tools are shown to be sufficient to produce these measurements using AVI's new 'Flux-area' technique.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Peter Fiekowsky and Daniel Selassie "Defect printability measurement on the KLA-351: correlation to defect sizing using the AVI metrology system", Proc. SPIE 3873, 19th Annual Symposium on Photomask Technology, (30 December 1999); https://doi.org/10.1117/12.373371
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