30 December 1999 Evaluation of lens aberrations depending on the transmittance of DUV-attenuated PSM
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Abstract
The effect of lens aberration in projection system is simulated for 0.2 micrometer isolated contact holes and 0.2 micrometer line/space patterns with conventional binary mask, 5% and 20% attenuated phase-shift-mask. The spherical aberration affects CD variation through focus on the 0.2 micrometer isolated contact holes for a 20% attenuated phase- shift-mask. Phase compensation is needed to minimize the CD variation. Line/space patterns are found to be insensitive to the spherical aberration. The comatic aberration is harmful for features as small as 0.2 micrometer line/space pairs. To satisfy the tolerance of 30 nm CD difference, the comatic aberration must be less than 0.05 (lambda) . The effect of astigmatism is negligible compared to the comatic aberration.
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JoHyun Park, Yong-Hoon Kim, Sung-Chul Lim, Kyung Hee Lee, Seong-Woon Choi, Hee-Sun Yoon, Jung-Min Sohn, "Evaluation of lens aberrations depending on the transmittance of DUV-attenuated PSM", Proc. SPIE 3873, 19th Annual Symposium on Photomask Technology, (30 December 1999); doi: 10.1117/12.373385; https://doi.org/10.1117/12.373385
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