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30 December 1999 Extension of graybeam writing for the 130-nm technology node
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This paper describes improvements in column design and writing strategy that, together, enable mask production for the 130 nm technology node. The MEBESR 5500 system employs a new high-dose electron gun and column design. We summarize experiments relating lithographic quality to increased dose and the effects of spot size and input address on lithography. These experiments are performed with ZEP 7000 resist and dry etch. A new graybeam writing strategy, Multipass Gray-II (MPG- II), is described in detail. This strategy creates eight dosed gray levels and provides increased writing throughput (up to 8X, compared to single-pass printing) without loss of lithographic quality. Significantly, critical dimension (CD) uniformity, butting, and other important specifications are improved with MPG-II. Lithographic results and throughput data are reviewed. A consequence of the improvement in CD control and throughput is greater productivity for 180 nm devices.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jan M. Chabala, Frank E. Abboud, Charles A. Sauer, Suzanne Weaver, Maiying Lu, Henry Thomas Pearce-Percy, Ulrich Hofmann, Matthew Vernon, Dinh Ton, Damon M. Cole, and Robert J. Naber "Extension of graybeam writing for the 130-nm technology node", Proc. SPIE 3873, 19th Annual Symposium on Photomask Technology, (30 December 1999);

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