30 December 1999 High-resolution DUV inspection system for 150-nm generation masks
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Abstract
In order to perform mask inspection with the high reliability for 150 nm-rule and below devices, the inspection system with high resolution is indispensable. The phase shift masks like DUV HT masks must also be inspected with high sensitivity. A next generation mask inspection system MC-3000 which used DUV optics has been developed, in order to achieve these requirement. The wavelength of this optics is 257 nm that is shorter than that of current UV inspection systems, and is nearly equal to that of current DUV lithography systems. Short wavelength light and high NA optics obtain high resolution, so the defect detection of 130 nm or less is attained. The special issues for the DUV optics were solved by several new techniques. This paper reports the system configuration, basic characteristics for defect detection and inspection performances.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Mitsuo Tabata, Mitsuo Tabata, Hideo Tsuchiya, Hideo Tsuchiya, Yasushi Sanada, Yasushi Sanada, Takeshi Nishizaka, Takeshi Nishizaka, Hiroaki Hirazawa, Hiroaki Hirazawa, Noboru Kobayashi, Noboru Kobayashi, Hideo Nagai, Hideo Nagai, Tomohide Watanabe, Tomohide Watanabe, Katsuki Oohashi, Katsuki Oohashi, Hiromu Inoue, Hiromu Inoue, Takehiko Nomura, Takehiko Nomura, Akira Ono, Akira Ono, } "High-resolution DUV inspection system for 150-nm generation masks", Proc. SPIE 3873, 19th Annual Symposium on Photomask Technology, (30 December 1999); doi: 10.1117/12.373309; https://doi.org/10.1117/12.373309
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