High-resolution thickness measurements and evaluation of a photomask blank

Teruyoshi Hirano; Ryuji Matsuo; Kozue Tomiyama; Ichiro Yazawa; Hiroshi Wada; Masao Otaki; Kazuhiko Omote

doi:10.1117/12.373351

30 December 1999 High-resolution thickness measurements and evaluation of a photomask blank

Teruyoshi Hirano, Ryuji Matsuo, Kozue Tomiyama, Ichiro Yazawa, Hiroshi Wada, Masao Otaki, Kazuhiko Omote

Proceedings Volume 3873, 19th Annual Symposium on Photomask Technology; (1999) https://doi.org/10.1117/12.373351
Event: Photomask Technology and Management, 1999, Monterey, CA, United States

Abstract

The film thickness estimation is one of most important subject for the design up of photomask blanks. For control of photomask specifications, the thickness measurement technology is the key of well-designed photomask blanks. The grazing- incidence X-ray reflectivity technology is very useful in order to measure thickness, density and interface roughness of photomask blank. In this paper, we reported the adaptation of the X-ray reflectivity technology to photomask evaluation. A Cr and ZrSi oxide thin photomask blanks were prepared with DC sputtering method. The X-ray reflectivities of those photomask blanks were measured with RIGAKU ATX-E diffractometer system. The thicknesses and densities of the photomask blanks were calculated with RIGAKU XDD degree(s) program. The coincidence between the calculated X-ray reflectivity curves with surface modified model which was defined with a surface oxidized layer is better than the calculated results without a surface oxidized layer. These results indicate that the photomask blanks have a surface oxidized layer. Thicknesses of the same position with same films were measured by ordinary technologies, for example, microscopic observation and thickness measurement technologies. The accuracy of those layer parameters which were calculated with X-ray reflectivity curves were better than those parameters measured with other microscopic and thickness measurement technologies.

Citation Download Citation

Teruyoshi Hirano, Ryuji Matsuo, Kozue Tomiyama, Ichiro Yazawa, Hiroshi Wada, Masao Otaki, and Kazuhiko Omote "High-resolution thickness measurements and evaluation of a photomask blank", Proc. SPIE 3873, 19th Annual Symposium on Photomask Technology, (30 December 1999); https://doi.org/10.1117/12.373351

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KEYWORDS

Photomasks

X-rays

Reflectivity

Scanning electron microscopy

X-ray technology

Interfaces

Chromium

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