30 December 1999 Incorporation of laser proximity correction into mask production
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The incorporation of laser proximity correction into mask production is presented. The ALTA 3000 has been chosen for demonstration. The goal is to improve pattern fidelity of the ALTA 3000 to a level comparable to the ALTA 3500. This provides the possibility to shift production from the ALTA 3500 to the ALTA 3000 and extends the lifetime of an ALTA 3000. The paper focuses on demonstrating different applications and the incorporation into the standard mask production flow.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Anja Rosenbusch, Anja Rosenbusch, James Unruh, James Unruh, Hartmut Kirsch, Hartmut Kirsch, David Y. Chan, David Y. Chan, } "Incorporation of laser proximity correction into mask production", Proc. SPIE 3873, 19th Annual Symposium on Photomask Technology, (30 December 1999); doi: 10.1117/12.373347; https://doi.org/10.1117/12.373347


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