30 December 1999 Line-width uniformity verification for 0.18-μm and below design rule reticles
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Abstract
A revolutionary CD error detection tool, the linewidth bias measurement (LBM), has been developed by the PDC group of Applied Material to solve the localized CD error detection issue for 0.18 micrometer and below design rule reticles. In this paper, we discussed, characterized and tested the LBM tool on both designed testers and real production reticles. Several potential applications have been demonstrated and discussed.
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TaiSheng Tan, Shen Chung Kuo, Wayne P. Shen, Nathan Schumann, Clare Wu, "Line-width uniformity verification for 0.18-μm and below design rule reticles", Proc. SPIE 3873, 19th Annual Symposium on Photomask Technology, (30 December 1999); doi: 10.1117/12.373368; https://doi.org/10.1117/12.373368
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