Measurement error revisited

Robert K. Henderson

doi:10.1117/12.373367

30 December 1999 Measurement error revisited

Robert K. Henderson

Proceedings Volume 3873, 19th Annual Symposium on Photomask Technology; (1999) https://doi.org/10.1117/12.373367
Event: Photomask Technology and Management, 1999, Monterey, CA, United States

Abstract

It is widely accepted in the electronics industry that measurement gauge error variation should be no larger than 10% of the related specification window. In a previous paper, 'What Amount of Measurement Error is Too Much?', the author used a framework from the process industries to evaluate the impact of measurement error variation in terms of both customer and supplier risk (i.e., Non-conformance and Yield Loss). Application of this framework in its simplest form suggested that in many circumstances the 10% criterion might be more stringent than is reasonably necessary. This paper reviews the framework and results of the earlier work, then examines some of the possible extensions to this framework suggested in that paper, including variance component models and sampling plans applicable in the photomask and semiconductor businesses. The potential impact of imperfect process control practices will be examined as well.

Citation Download Citation

Robert K. Henderson "Measurement error revisited", Proc. SPIE 3873, 19th Annual Symposium on Photomask Technology, (30 December 1999); https://doi.org/10.1117/12.373367

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