30 December 1999 Measurement error revisited
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Abstract
It is widely accepted in the electronics industry that measurement gauge error variation should be no larger than 10% of the related specification window. In a previous paper, 'What Amount of Measurement Error is Too Much?', the author used a framework from the process industries to evaluate the impact of measurement error variation in terms of both customer and supplier risk (i.e., Non-conformance and Yield Loss). Application of this framework in its simplest form suggested that in many circumstances the 10% criterion might be more stringent than is reasonably necessary. This paper reviews the framework and results of the earlier work, then examines some of the possible extensions to this framework suggested in that paper, including variance component models and sampling plans applicable in the photomask and semiconductor businesses. The potential impact of imperfect process control practices will be examined as well.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Robert K. Henderson, Robert K. Henderson, } "Measurement error revisited", Proc. SPIE 3873, 19th Annual Symposium on Photomask Technology, (30 December 1999); doi: 10.1117/12.373367; https://doi.org/10.1117/12.373367
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