Measurement of residual birefringence in photomask blanks

Baoliang Bob Wang; Patrick M. Troccolo

doi:10.1117/12.373349

30 December 1999 Measurement of residual birefringence in photomask blanks

Baoliang Bob Wang, Patrick M. Troccolo

Proceedings Volume 3873, 19th Annual Symposium on Photomask Technology; (1999) https://doi.org/10.1117/12.373349
Event: Photomask Technology and Management, 1999, Monterey, CA, United States

Abstract

Residual linear birefringence is an important property for quality control of optical components used in optical lithographic instruments. We present in this paper a sensitive instrument to measure both the magnitude and angular orientation of residual linear birefringence in optical components, including photomask blanks. A variety of optical components are studied using this instrument. We will focus on the birefringence measurement of photomask blanks in this report. We have identified different patterns and levels of residual linear birefringence in these samples. We hope that the data provided in this paper will be helpful to the suppliers of photomask blanks, photomask manufacturers, and producers of optical microlithography instruments.

Citation Download Citation

Baoliang Bob Wang and Patrick M. Troccolo "Measurement of residual birefringence in photomask blanks", Proc. SPIE 3873, 19th Annual Symposium on Photomask Technology, (30 December 1999); https://doi.org/10.1117/12.373349

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