Traceability, reproducibility, and comparability of grid calibrations

Harald Bosse; Wolfgang Haessler-Grohne; Bernd Brendel

doi:10.1117/12.373342

30 December 1999 Traceability, reproducibility, and comparability of grid calibrations

Harald Bosse, Wolfgang Haessler-Grohne, Bernd Brendel

Proceedings Volume 3873, 19th Annual Symposium on Photomask Technology; (1999) https://doi.org/10.1117/12.373342
Event: Photomask Technology and Management, 1999, Monterey, CA, United States

Abstract

The national metrology institute of Germany, PTB, offers traceable, two-dimensional pattern placement calibrations of microstructures on masks. Whereas the measurement uncertainty for the calibrated pattern positions in terms of traceable coordinate values is only comparable to the position tolerances actually required for mask patterning, i.e. about 35 nm, the deviations from the design grid can be determined with smaller uncertainties. In calibration certificates offered by PTB, these differences are taken into account and the uncertainties for the length of the grid and the uncertainties for the position deviations from the design grid are quoted separately as 30 nm and 10 nm respectively. Developments to further reduce the uncertainties are under way. An analysis of photomask recalibration results shows the long-term reproducibility of PTB length calibrations to be better than 15 nm or 1*10^-7, including substrate stability effects. Details of the recalibration results will be given. Leica Microsystems Lithography runs a laboratory for two-dimensional pattern placement calibrations, formally accredited by PTB within DKD, the German calibration service. Results of recent comparison measurements between the DKD laboratory and PTB on masks of different size will be given and discussed as an example of the process of dissemination of the length unit to industry.

Citation Download Citation

Harald Bosse, Wolfgang Haessler-Grohne, and Bernd Brendel "Traceability, reproducibility, and comparability of grid calibrations", Proc. SPIE 3873, 19th Annual Symposium on Photomask Technology, (30 December 1999); https://doi.org/10.1117/12.373342

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