30 December 1999 Using linear programming to improve the determination of photomask magnification and orthogonality corrections
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Abstract
A method of improving the determination of photomask magnification and orthogonality corrections using linear programming (LP) is presented. The method discusses the inadequacies of the current methods and how LP modeling provides a more rigorous approach for determining the optimum corrections for an arbitrary set of customers, lithography tools, and cassettes. A detailed description is provided of the LP model formulation. A sample problem is discussed using actual production data to show one such set of corrections and an estimate is provided of the improvement that can be achieved with their implementation. Finally, possible refinements to the model are discussed along with suggestions regarding the technique's incorporation into a software application.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Mark D. Cerio, Mark D. Cerio, } "Using linear programming to improve the determination of photomask magnification and orthogonality corrections", Proc. SPIE 3873, 19th Annual Symposium on Photomask Technology, (30 December 1999); doi: 10.1117/12.373370; https://doi.org/10.1117/12.373370
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