Development behavior of irradiated foils and microstructures

Pascal Meyer; Aida El-Kholi; Juergen Mohr; Clifford Cremers; Faycal Bouamrane; Stephan Megtert

doi:10.1117/12.361235

30 August 1999 Development behavior of irradiated foils and microstructures

Pascal Meyer, Aida El-Kholi, Juergen Mohr, Clifford Cremers, Faycal Bouamrane, Stephan Megtert

Proceedings Volume 3874, Micromachining and Microfabrication Process Technology V; (1999) https://doi.org/10.1117/12.361235
Event: Symposium on Micromachining and Microfabrication, 1999, Santa Clara, CA, United States

Abstract

The LIGA process, which combines x-ray lithography with electroplating and modeling, is a world wide used technique for the fabrication of high aspect ratio microstructures. In the first step a resist layer, typically PMMA, which is applied to a metal coated substrate, is patterned by shadow printing through a x-ray mask with synchrotron radiation. The exposed parts are subsequently dissolved in an organic developer. The achievable quality of the microstructure is decisively defined by the development process. In order to define an effective development process and create a simulation tool, which allows to foretell the needed development parameters and the achievable quality already at a design stage, the development behavior and its influencing parameters need to be investigated. Much work has been done in this area. In these previous studies, the development rate was either studied using PMMA foils in which a homogeneous dose or a dose profile has been deposited, or using irradiated microstructures. In the first case, result obtained by ex-situ measurements show, that the development rate is a bare function of the dose. In case of irradiated microstructures, the experimentally obtained development rate was described as an empirical function of the dose value and depth of dose deposition. The aim of this work is to investigate the difference in the development behavior of a microstructure compared to a foil and to link the results. Therefore, using in-situ measurements, we have made experiments using foils and microstructures with crosslinked and non-crosslinked PMMA covering a wide dose range. The final purpose is to find a relation between dose and development rate to determine the necessary development time of a sample with a given dose profile, with high precision. Experiments, result and simulation of the development rate, for the two kinds of materials are presented and discussed.

Citation Download Citation

Pascal Meyer, Aida El-Kholi, Juergen Mohr, Clifford Cremers, Faycal Bouamrane, and Stephan Megtert "Development behavior of irradiated foils and microstructures", Proc. SPIE 3874, Micromachining and Microfabrication Process Technology V, (30 August 1999); https://doi.org/10.1117/12.361235

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available