3 September 1999 Characterization of micromachined structures: comparison of measurement and theory
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Proceedings Volume 3875, Materials and Device Characterization in Micromachining II; (1999) https://doi.org/10.1117/12.360474
Event: Symposium on Micromachining and Microfabrication, 1999, Santa Clara, CA, United States
Abstract
Using the MEMSPEC-2000TM prototype test station, several micromachined structures have been characterized. The MEMSPEC-2000TM test station employs a laser based non- contact measurement technique to determine the 3D profile of the test structure. Vertical resolution of 0.1 micron and lateral resolution of approximately 1 micron can be achieved. The bandwidth of the sensor is DC to 100 kHz, allowing for time domain measurements of moving structures to be made. Standard static surface profiles have been measured for a number of varied types of test structures. The results of these measurements will be compared with design values. The time response of activated test structures will also be presented and compared to the theoretical predictions based upon modeling equations.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Steven C. Aceto, Adolfo O. Gutierrez, Michelle D. Simkulet, Thomas W. Krawczyk, Michael Lienhard, Andrew Lundgren, Brandon Houghton, David Patti, "Characterization of micromachined structures: comparison of measurement and theory", Proc. SPIE 3875, Materials and Device Characterization in Micromachining II, (3 September 1999); doi: 10.1117/12.360474; https://doi.org/10.1117/12.360474
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