3 September 1999 Characterization of nanostructures micromachined with focused ion beams (FIBs)
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Proceedings Volume 3875, Materials and Device Characterization in Micromachining II; (1999) https://doi.org/10.1117/12.360478
Event: Symposium on Micromachining and Microfabrication, 1999, Santa Clara, CA, United States
Abstract
In this paper the authors would like to demonstrate, using Atomic Force Microscopy (AFM), the effects of parameters such as probe current on the micromachined profiles produced by focused ion beam. We will compare these results obtained with AFM with those using scanning electron microscopy. Control of these parameters in the fabrication of nanostructures on different substrate materials such as metals and semiconductors will also be demonstrated.
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Catherine Y. Wong, Catherine Y. Wong, Jie Xhie, Jie Xhie, Keith M. Moulding, Keith M. Moulding, } "Characterization of nanostructures micromachined with focused ion beams (FIBs)", Proc. SPIE 3875, Materials and Device Characterization in Micromachining II, (3 September 1999); doi: 10.1117/12.360478; https://doi.org/10.1117/12.360478
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