31 August 1999 New approach for nonsilicon-micromachined three-dimensional multilevel diffractive optical elements
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Proceedings Volume 3879, Micromachine Technology for Diffractive and Holographic Optics; (1999) https://doi.org/10.1117/12.360536
Event: Symposium on Micromachining and Microfabrication, 1999, Santa Clara, CA, United States
Abstract
In this paper, we developed a nonsilicon surface- micromachining technique that uses a thick photoresist film and a spattered copper layer as two sacrificial layers and uses the electroplated ferronickel (FeNi) as the structure material. The proposed nonsilicon micromachining process is simpler, with relatively low temperature, and more flexible for various materials. By using such technique, silica or glass can be used as an optical material. Several out-of- plane multilevel diffractive optical elements (DOE's) including gratings, phase Fresnel lenses and some other optical components supported by FeNi microstructures are successfully constructed on the silicon wafer. Those DOE's are fabricated by several steps both of photolithography and reactive ion etching on the spattered silica layer. This technology offers a new approach to fabricate high quality phase micro-optical elements for free-space integrated micro-optics and other applications.
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Guangya Zhou, Guangya Zhou, Yi-Xin Chen, Yi-Xin Chen, Mingsheng Zhang, Mingsheng Zhang, Xiaolin Zhao, Xiaolin Zhao, Zongguang Wang, Zongguang Wang, } "New approach for nonsilicon-micromachined three-dimensional multilevel diffractive optical elements", Proc. SPIE 3879, Micromachine Technology for Diffractive and Holographic Optics, (31 August 1999); doi: 10.1117/12.360536; https://doi.org/10.1117/12.360536
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